The Agar high resolution sputter coater offers a real solution to the problems encountered when coating difficult samples for FEG SEM imaging. To minimise the effect of grain size, the coater gives full control over thickness and deposition conditions. The turbomolecular drag pump provides the high vacuum necessary for sputtering non-noble metals, while having excellent gas handling characteristics. The magnetron sputtering head has the high current capability required for sputtering chromium and a source shutter for target conditioning is provided as standard.

The rotary planetary stage with tilt ensures that highly contoured samples are evenly coated. This ensures that the minimum coating thickness can be applied to give conductivity without compromising fine specimen detail. The dual height 150mm diameter work chamber gives easy adjustment of working distance.

The integrated terminating film thickness monitor allows the coating thickness to be closely controlled and reproduced for repeat samples.