Automatic Sputter Coater
A more advanced sputter coater where the complete sequence of flush, leak, coat and vent is automatically controlled.
A more advanced sputter coater where the complete sequence of flush, leak, coat and vent is automatically controlled. The solenoid operated leak valve allows the gas pressure to return automatically to pre-set conditions. The coater can also be operated in the manual mode if required. The sputter current is set by a digital programmer and is independent of the gas pressure. Sputtering currents up to 40mA allow a range of target materials to be efficiently sputtered by the magnetron head. Coating time can be set, stored and displayed by the digital timer.
Further automation can be achieved with the addition of the terminating film thickness monitor. With this fitted, the desired thickness can be entered and the sputtering process is automatically terminated when this thickness has been reached.
Chamber size AGB7341 : 120 x 120mm.
Chamber size AGB7341SE : 150 x 165mm.
| Sputter head | Low voltage planar magnetron type with quick target change, wrap-around dark-space shield |
| Sputter target | Gold target ø57 x 0.1mm fitted as standard. Optional targets: Au/Pd, Pt, Pt/Pd, Ag 57mm dia. x 0.1mm thick, or 57mm dia. x 0.2mm thick |
| Sputter supply | Programmable digital control, microprocessor-based, safety interlocked, current control independent of vacuum, 10 - 40mA |
| Sample table | Holds 12 SEM ½” (12.5 mm) stubs delivered as standard, height adjustment through 60mm. R-T stage available for AGB7341, R-T and R-P-T stage available for AGB7341SE |
| Analogue metering | Vacuum: atmosphere - 0.001mb, Current: 0 - 50mA |
| Dimensions (W x D x H) | 420mm x 295mm x 287 mm |
| Weight | 11kg |
| Weight | 40VA max (excluding rotary pump) |
| Pumping system speed | 3.0/3.6m3/hr (50/60Hz). Pump downtime to 0.1mb is 20/25 sec |
| Benchtop system | Vacuum pump is mounted on benchtop compatible anti-vibration table with stainless steel bellows coupling system |
| Pumping system dimensions (W x D x H) | 330mm x 215mm x 210mm (270mm with filter) x 210 mm |
| Pumping system weight | 15kg |
| Pumping system power | 13 |
| Sputter head | Low voltage planar magnetron type with quick target change, wrap-around dark-space shield |
| Sputter target | Gold target ø57 x 0.1mm fitted as standard. Optional targets: Au/Pd, Pt, Pt/Pd, Ag 57mm dia. x 0.1mm thick, or 57mm dia. x 0.2mm thick |
| Sputter supply | Programmable digital control, microprocessor-based, safety interlocked, current control independent of vacuum, 10 - 40mA |
| Sample table | Holds 12 SEM ½” (12.5 mm) stubs delivered as standard, height adjustment through 60mm. R-T stage available for AGB7341, R-T and R-P-T stage available for AGB7341SE |
| Analogue metering | Vacuum: atmosphere - 0.001mb, Current: 0 - 50mA |
| Dimensions (W x D x H) | 420mm x 295mm x 287 mm |
| Weight | 11kg |
| Weight | 40VA max (excluding rotary pump) |
| Pumping system speed | 3.0/3.6m3/hr (50/60Hz). Pump downtime to 0.1mb is 20/25 sec |
| Benchtop system | Vacuum pump is mounted on benchtop compatible anti-vibration table with stainless steel bellows coupling system |
| Pumping system dimensions (W x D x H) | 330mm x 215mm x 210mm (270mm with filter) x 210 mm |
| Pumping system weight | 15kg |
| Pumping system power | 13 |